Plasmonic nanocomposites of zinc oxide and titanium nitride
نویسندگان
چکیده
منابع مشابه
Experimental demonstration of titanium nitride plasmonic interconnects.
An insulator-metal-insulator plasmonic interconnect using TiN, a CMOS-compatible material, is proposed and investigated experimentally at the telecommunication wavelength of 1.55 µm. The TiN waveguide was shown to obtain propagation losses less than 0.8 dB/mm with a mode size of 9.8 µm on sapphire, which agree well with theoretical predictions. A theoretical analysis of a solid-state structure ...
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High aspect ratio titanium nitride (TiN) grating structures are fabricated by the combination of deep reactive ion etching (DRIE) and atomic layer deposition (ALD) techniques. TiN is deposited at 500 ◦C on a silicon trench template. Silicon between vertical TiN layers is selectively etched to fabricate the high aspect ratio TiN trenches with the pitch of 400 nm and height of around 2.7 μm. Diel...
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In recent years, research into materials with high dielectric constants, including doped titanium oxide, has increased because of the potential for modern microelectronics applications and high-density energy storage. The aim of this study was to investigate the effects of zinc oxide as an acceptor additive on the dielectric properties and microstructure of titanium oxide ceramics. The amount o...
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Titanium nitride is considered a promising alternative plasmonic material and is known to exhibit localized surface plasmon resonances within the near-infrared biological transparency window. Here, local heating efficiencies of disk-shaped nanoparticles made of titanium nitride and gold are compared in the visible and near-infrared regions numerically and experimentally with samples fabricated ...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A
سال: 2020
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.5142858